石英ガラスの衝撃値に及ぼす電子線照射の影響 Influences of Electron Beam Irradiation on Impact Value for Silica Glass

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著者

    • 岩田 圭祐 IWATA Keisuke
    • 東海大学大学院工学研究科金属材料工学専攻 Department of Metallurgical Engineering, Graduate School of Engineering, Tokai University
    • 利根川 昭 TONEGAWA Akira
    • 東海大学連合大学院理工学研究科理工学専攻 Department of Science and Technology, Unified Graduate School of Science and Technology, Tokai University
    • 西 義武 NISHI Yoshitake
    • 東海大学大学院工学研究科金属材料工学専攻 Department of Metallurgical Engineering, Graduate School of Engineering, Tokai University

抄録

  Influences of electron beam (EB) irradiation on the impact value for silica glass were studied by using a standard Charpy impact test. EB irradiation below 0.216 MGy, which was one of short-time treatments of dry process at low temperature, increased impact values of the glass. As the EB irradiation generated dangling bonds of the E′ center at the silicon-oxygen atomic pairs in the silica glass, partial relaxation occurred at points of residual strain near dangling bonds in the network structure mainly constructed with silicon-oxygen pairs. If the inter-atomic distance of the silicon-oxygen pairs became to be optimum potential curves of the silica glass, the relaxation should increase the bonding energy of the network structure. Evidently, the increased impact value was mainly due to an increase in the bonding energy for the silicon-oxygen atomic pairs in the atomic network structure, as well as a relaxation of the network structure.<br>

収録刊行物

  • 日本金屬學會誌 = Journal of the Japan Institute of Metals  

    日本金屬學會誌 = Journal of the Japan Institute of Metals 70(10), 840-844, 2006-10-20 

    The Japan Institute of Metals

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各種コード

  • NII論文ID(NAID)
    10018310786
  • NII書誌ID(NCID)
    AN00062446
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    00214876
  • NDL 記事登録ID
    8550710
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-314
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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