固相とレーザーの組み合わせ結晶化による結晶方位制御の可能性

• 浅野 種正

  九州文学文学院システム情報科学研究科電子デバイス工学

• 中川 豪

  九州文学文学院システム情報科学研究科電子デバイス工学

書誌事項

タイトル別名

• Orientation Control of Silicon Crystal Grain by Combination of Metal-Induced Solid-Phase Crystallization and Excimer Laser Annealing
• コソウ ト レーザー ノ クミアワセ ケッショウカ ニ ヨル ケッショウ ホウイ セイギョ ノ カノウセイ

抄録

A novel technique of location and orientation control of Si crystal grain by combining metal-induced solidphase annealing and excimer laser annealing (ELA) is demonstrated. Two solid-phase annealing processes were investigated.(1) Metal (Ni) nano-imprint at the a-Si film surface is used for the purpose of creating {111} oriented Si crystal nuclei which act as the seed for the subsequent crystallization using ELA. The annealing to form nuclei at the imprinted sites was carried out at temperatures below 450 °C. ELA using XeCl laser of the sample resulted in the formation of 2.5 μm-sized Si grains at the imprinted sites, while {111} orientation was not observed.(2) The starting a-Si film is deposited on SiO₂ substrate having cone-shaped shallow pits. Ni-metal induced lateral crystallization (Ni-MILC) is used to form highly {110} oriented polySi. After XeCl-laser-based ELA, 2.5 μm-sized Si grains having the same orientation as that determined by NiMILC were produced at the pit sites. It suggests that location and orientation control is possible by combining MILC and ELA.

収録刊行物

• レーザー研究

  レーザー研究 34 (10), 684-688, 2006

  一般社団法人 レーザー学会

キーワード

• Thin film transistor
• Polycrystalline silicon
• Nano-imprint
• Laser anneal
• Crystal orientation control

詳細情報

• CRID: 1390001204645446144
• NII論文ID: 10018312187
• NII書誌ID: AN00255326
• DOI: 10.2184/lsj.34.684
• COI: 1:CAS:528:DC%2BD28Xht1emsrjJ
• ISSN: 13496603
• ISSN: 03870200
• ISSN: http://id.crossref.org/issn/03870200
• NDL書誌ID: 8546772
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8546772
• Web Site: https://www.jstage.jst.go.jp/article/lsj/34/10/34_684/_pdf
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• 抄録ライセンスフラグ: 使用不可