Manufacturing of high aspect-ratio p-n junctions using Vapor Phase Doping for application in multi-Resurf devices

• ROCHERFORT C.

収録刊行物

• Proc. ISPSD2002

  Proc. ISPSD2002 2002

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• CRID: 1571698600309974528
• NII論文ID: 10018312758
• データソース種別:
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