A Practical Method for Rapid Microchannel Fabrication in Polydimethylsiloxane by Replica Molding without Using Silicon Photoresist
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- Briones Maria Portia P.
- Nanotechnology Research Institute, National Institute of Advanced Science and Technology (AIST)
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- Honda Takeshi
- Nanotechnology Research Institute, National Institute of Advanced Science and Technology (AIST)
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- Yamaguchi Yoshiko
- Nanotechnology Research Institute, National Institute of Advanced Science and Technology (AIST)
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- Miyazaki Masaya
- Nanotechnology Research Institute, National Institute of Advanced Science and Technology (AIST) Department of Molecular and Material Sciences, Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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- Nakamura Hiroyuki
- Nanotechnology Research Institute, National Institute of Advanced Science and Technology (AIST)
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- Maeda Hideaki
- Nanotechnology Research Institute, National Institute of Advanced Science and Technology (AIST) Department of Molecular and Material Sciences, Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
Bibliographic Information
- Other Title
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- Practical Method for Rapid Microchannel Fabrication in Polydimethylsiloxane by Replica Molding without Using Silicon Photoresist
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Abstract
This paper describes a very simple and rapid method for fabrication of microfluidic devices on the material polydimethylsiloxane (PDMS). The fabrication process is greatly simplified by using a micromachined polymethylmethacrylate (PMMA) master instead of using a silicon photoresist. A PDMS pre-polymer mixture was cast over the PMMA master and cured to produce positive relief structures in PDMS which then served as a mold. This PDMS mold was conveniently used for multiple production of PDMS replicas containing the desired microstructures similar to those on the surface of the original PMMA master. Because our procedure does not require a photoresist, it minimizes the requirement for special equipment and decreases the total fabrication time. Moreover, the method offers the advantage of a wide range of feature size, specifically deeper channels unobtainable with silicon photoresist. Examination of the sidewalls of the channels revealed high fidelity in reproducing the PMMA master via the hardened-PDMS mold. Our protocol enables the production of multiple PDMS-based microfluidic devices in a low-cost and efficient manner.
Journal
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- JOURNAL OF CHEMICAL ENGINEERING OF JAPAN
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JOURNAL OF CHEMICAL ENGINEERING OF JAPAN 39 (10), 1108-1114, 2006
The Society of Chemical Engineers, Japan
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Details
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- CRID
- 1390282679546872576
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- NII Article ID
- 10018326909
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- NII Book ID
- AA00709658
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- ISSN
- 18811299
- 00219592
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- NDL BIB ID
- 8513630
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed