Effects of Antenna Size and Configurations in Large-Area RF Plasma Production with Internal Low-Inductance Antenna Units

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Recent trends of liquid crystal display (LCD) fabrication toward a significant enlargement of glass substrates require large-area plasma sources with a scale length exceeding 1 m. To meet this requirement, large-area plasma sources with internal low-inductance antenna (LIA) units have been developed for uniform processes, in which design principles for selecting antenna size and configurations in the multiple installation of the LIA units are established. In this study, the effects of antenna size were examined in terms of plasma production characteristics indicating small increase in plasma density with a decrease in antenna size (or antenna impedance). Furthermore, plasma density distributions with the LIA units were investigated to understand the nature of plasma diffusion, which can be utilized for designing plasma profiles with multiple LIA units. First, it was shown that the plasma density distributions followed exponential decay as a function of distance from the antenna. Secondly, the measured plasma density profiles with multiple LIA units were shown to agree well with those obtained by superposing those described by exponential functions, which can be utilized for prediction.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 45(10B), 8042-8045, 2006-10-30

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018338770
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8519885
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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