Pulsed Regime of a Hollow-Cathode Discharge Used in a Sputter Source
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The pulsed operation of a cavity hollow-cathode post-discharge sputtering source was proposed to facilitate the sputtering of low-conductivity materials. Self-oscillating and externally driven pulsed regimes were investigated. The plasma density, temperature and relative density of atomic species along the discharge axis were determined by optical emission spectroscopy and Langmuir probe diagnostics. The temporal evolution of these parameters and dynamic current–voltage characteristics of the discharge were recorded in both regimes as functions of gas pressure and discharge current. The results bring more insight into the utilization of the above-mentioned device as a small sputtering source.
- Jpn J Appl Phys
Jpn J Appl Phys 45(10B), 8132-8136, 2006-10-30
INSTITUTE OF PURE AND APPLIED PHYSICS