Observation of OH Radical Reactions with Atomic Hydrogen in He/H2O Plasmas by Laser-Induced Fluorescence Spectroscopy

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著者

    • Shoji Akira
    • Graduate School of Engineering, Hiroshima University, Higashi-Hiroshima, Hiroshima 739-8527, Japan
    • Kwon Jun-Hyoun
    • Digital Appliances R&D Center, Samsung Electronics Co., Ltd., 416, Maetan-3 Dong, Yeongtong-Gu, Suwon-City, Gyeonggi-Do 443-742, Korea
    • Park Rae-Eun
    • Digital Appliances R&D Center, Samsung Electronics Co., Ltd., 416, Maetan-3 Dong, Yeongtong-Gu, Suwon-City, Gyeonggi-Do 443-742, Korea
    • Nojima Hideo
    • Digital Appliances R&D Center, Samsung Electronics Co., Ltd., 416, Maetan-3 Dong, Yeongtong-Gu, Suwon-City, Gyeonggi-Do 443-742, Korea

抄録

A novel atmospheric pressure plasma device that generates atomic hydrogen has been developed. The reaction of OH radicals with atomic hydrogen supplied from the device was investigated in a He/H2O mixture at a pressure of 530 Torr by laser-induced fluorescence (LIF) spectroscopy. OH radicals were generated using a dielectric barrier discharge (DBD) plasma and excited to $\text{A}{^{2}}\Sigma^{+}(v'=1)$ from $\text{X}{^{2}\Pi}(v''=0)$ by a frequency-doubled dye laser (282 nm). When the device was operated, OH-LIF intensity was reduced near the DBD plasma. The spatial density profile of the OH radicals was also obtained when the device was turned on and off. The reaction mechanism was briefly discussed.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes  

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 45(10B), 8260-8263, 2006-10-30 

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018339509
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8520749
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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