Etching of Multi-Walled Carbon Nanotubes Using Energetic Plasma Ions

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The interactions between energetic ions and nanotubes are important in the fabrication of plasma-aided carbon nanotubes, especially in the process of sputter-etching and particle encapsulation into the nanotubes. In this study, it was investigated that the bamboo structured multi-walled carbon nanotubes (MWNTs) was sputter-etched by plasma ion irradiation with various energies which were less than those used in the ion beam experiments. In the plasma, the surface opening of the MWNTs began at the irradiated ion energy of 20 eV and the open tips of the MWNTs were obtained by increasing the irradiated ion energy as 70 eV. When the ion energy exceeded 100 eV, the etching was enhanced by the rupturing and breaking processes and almost half of the MWNTs were etched out by the 150 eV ions. The irradiated ion energy was controlled effectively by the sheath potential formed in front of the MWNTs which was immersed in the nitrogen plasma.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes  

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 45(10B), 8317-8322, 2006-10-30 

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018339676
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8520980
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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