Comparative Study on Chemical Vapor Deposition of Diamond-Like Carbon Films from Methane and Acetylene Using RF Plasma

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著者

    • Hassan Md. Kamrul Hassan Md. Kamrul
    • Department of Electronic and Photonic Systems Engineering, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami-gun, Kochi 782-8502, Japan
    • Hatta Akimitsu Hatta Akimitsu
    • Department of Electronic and Photonic Systems Engineering, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami-gun, Kochi 782-8502, Japan

抄録

Diamond-like carbon films (DLC) were prepared by radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) at a frequency of 13.56 MHz using methane (CH4) and acetylene (C2H2) at different RF powers. Optical emission spectroscopy (OES) was carried out to investigate plasma chemistry. The intensity of Hα in the C2H2 plasma was about one-half that in the CH4 plasma, whereas in both cases, the intensities of CH radicals were similar. The resistivity of the deposited films decreased with an increase in RF power, whereas growth rate increased with RF power. CH4-based films were found to be more insulating than C2H2-based films at high RF powers. The high resistivity of the films was obtained from both CH4 and C2H2 at low RF powers. The insulating property was due to the hydrogenation of sp2 bonds in the films.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes  

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 45(10B), 8398-8400, 2006-10-30 

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018339961
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8521177
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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