Negative Ion Transfer Model of Low-Temperature Oxidation of Silicon Surface by High-Density Microwave Plasma

• Isahiro Hasegawa

• Takeshi Yamauchi

• Hideo Sugai

書誌事項

タイトル別名

• Negative Ion Transfer Model of Low Temperature Oxidation of Silicon Surface by High Density Microwave Plasma

収録刊行物

• Japanese journal of applied physics. Part 2, Letters & express letters

  Japanese journal of applied physics. Part 2, Letters & express letters 45 (37-41), L1022-1024, 2006-10

  Tokyo : Japan Society of Applied Physics

キーワード

• plasma oxidation
• microwave plasma
• radical
• silicon oxidation
• Jorgensen-Mott model

詳細情報

• CRID: 1520573330143923328
• NII論文ID: 10018340598
• NII書誌ID: AA11906093
• ISSN: 00214922
• NDL書誌ID: 8519845
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8519845
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • CiNii Articles