Effects of Ar/N_2 Flow Ratio on Sputtered-AlN Film and Its Application to Low-Voltage Organic Thin-Film Transistors

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著者

    • Zan Hsiao-Wen ZAN Hsiao-Wen
    • Department of Photonics and Institute of Electro-Optical Engineering and Display Institute, National Chiao Tung University
    • Yen Kuo-Hsi YEN Kuo-Hsi
    • Department of Photonics and Institute of Electro-Optical Engineering and Display Institute, National Chiao Tung University
    • KU Kuo-Hsin
    • Department of Materials Science and Engineering, National Tsing Hua University
    • CHEN Chien-Hsun
    • Department of Materials Science and Engineering, National Tsing Hua University
    • HWANG Jennchang
    • Department of Materials Science and Engineering, National Tsing Hua University

収録刊行物

  • Japanese journal of applied physics. Pt. 2, Letters

    Japanese journal of applied physics. Pt. 2, Letters 45(37), L1093-L1096, 2006-10-25

    Japan Society of Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018340912
  • NII書誌ID(NCID)
    AA10650595
  • 本文言語コード
    ENG
  • 資料種別
    SHO
  • ISSN
    00214922
  • NDL 記事登録ID
    8520226
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z54-J337
  • データ提供元
    CJP書誌  NDL 
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