Future prospects of lithography

• OKAZAKI Shinji

  Association of Super-Advanced Electronics Technologies

Bibliographic Information

Other Title

• リソグラフィー技術の将来展望
• リソグラフィー ギジュツ ノ ショウライ テンボウ

Abstract

Developments in integrated circuits are heavily dependent on the advancement of optical lithography. As the resolution limit is on the horizon, various compromises on the design side must be considered. To overcome this situation, various new lithographic technologies have been developed, such as extreme ultra violet lithography (EUVL) and nanoimprint lithography. However, for the practical use of these technologies, there are many issues to be overcome. Many people believe that the successor of optical lithography will still be an optical method. To realize this, liquid immersion technology using highly refractive materials and multiple exposure/patterning techniques are being intensively developed. Such activities are summarized and future prospects are introduced.

Journal

• Oyo Buturi

  Oyo Buturi 75 (11), 1328-1334, 2006-11-10

  The Japan Society of Applied Physics

Keywords

• optical lithography
• optical proximity effect correction
• design for manufacturability
• immersion lithography
• high refractive index materials
• extreme ultra violet lithography
• laser produced plasma source
• discharge produced plasma source
• multilayer reflective mirror
• nanoimprint lithography

Details

• CRID: 1390282752332235392
• NII Article ID: 10018341675
• NII Book ID: AN00026679
• DOI: 10.11470/oubutsu.75.11_1328
• ISSN: 21882290
• ISSN: 03698009
• NDL BIB ID: 8521860
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8521860
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • CiNii Articles
• Abstract License Flag: Disallowed