Charge Density Analysis of Silicon using Convergent-Beam Electron Diffraction

• Ogata Yoichiro

  Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

• Tsuda Kenji

  Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

• Tanaka Michiyoshi

  Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

Bibliographic Information

Other Title

• 収束電子回折法によるSiの電子密度分布解析

Journal

• Materia Japan

  Materia Japan 45 (12), 885-885, 2006

  The Japan Institute of Metals and Materials

Keywords

• convergent-beam electron diffraction
• dynamical diffraction
• charge density
• covalent bonding

Details

• CRID: 1390001204078694656
• NII Article ID: 10018421978
• NII Book ID: AN10433227
• DOI: 10.2320/materia.45.885
• ISSN: 18845843
• ISSN: 13402625
• Web Site: https://www.jstage.jst.go.jp/article/materia1994/45/12/45_12_885/_pdf
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles
  • KAKEN