Processing of Three Dimensional Components and its Applications

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著者

    • YUKIMURA Ken
    • Plasma Application laboratory, Department of Electrical Engineering, Doshisha University

抄録

The plasma-ion processing of three-dimensional components tends to expand various fields from microelectronics to environmental industries. The recent trend is not only surface modification by thin film prepared by reactive deposition using a metallic plasma source generated in reactive gases, but also deep layer ion-penetration of the component using thermal diffusion. The substrates are immersed in the plasma and are pulse-biased with a low voltage. This article introduces the plasma-ion processing for three dimensional components, and its merits and drawbacks, and examples of the applications are also shown.

収録刊行物

  • 電気学会論文誌. A, 基礎・材料・共通部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals and Materials Society

    電気学会論文誌. A, 基礎・材料・共通部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals and Materials Society 127(1), 7-8, 2007-01-01

    The Institute of Electrical Engineers of Japan

参考文献:  7件中 1-7件 を表示

  • <no title>

    CHEUNG N. W.

    Surf. Coat. Technol. 156, 24-30, 2002

    被引用文献1件

  • <no title>

    SUN M.

    J. Vac. Sci. Technol A 16(4), 2718-2721, 1998

    被引用文献2件

  • <no title>

    ENSINGER W.

    Materials Sci. Engin A 253, 258-268, 1998

    被引用文献1件

  • <no title>

    BLAWERT C.

    Surf. Coat. Technol. 93, 274-279, 1997

    被引用文献1件

  • <no title>

    SUCHENTRUNK R.

    Surf. Coat. Technol. 97, 1-9, 1997

    被引用文献1件

  • <no title>

    ONATE J. I.

    Surf. Coat. Technol. 103-104, 185-190, 1998

    被引用文献1件

  • <no title>

    PANCKOW A. N.

    Surf. Coat. Technol. 163-164, 128-134, 2003

    被引用文献1件

各種コード

  • NII論文ID(NAID)
    10018456837
  • NII書誌ID(NCID)
    AN10136312
  • 本文言語コード
    ENG
  • 資料種別
    REV
  • ISSN
    03854205
  • データ提供元
    CJP書誌  J-STAGE 
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