Processing of Three Dimensional Components and its Applications

• Yukimura Ken

  Plasma Application laboratory, Department of Electrical Engineering, Doshisha University

Abstract

The plasma-ion processing of three-dimensional components tends to expand various fields from microelectronics to environmental industries. The recent trend is not only surface modification by thin film prepared by reactive deposition using a metallic plasma source generated in reactive gases, but also deep layer ion-penetration of the component using thermal diffusion. The substrates are immersed in the plasma and are pulse-biased with a low voltage. This article introduces the plasma-ion processing for three dimensional components, and its merits and drawbacks, and examples of the applications are also shown.

Journal

• IEEJ Transactions on Fundamentals and Materials

  IEEJ Transactions on Fundamentals and Materials 127 (1), 7-8, 2007

  The Institute of Electrical Engineers of Japan

Keywords

• plasma
• ion
• PBII&D
• plasma-ion processing
• tribology
• doping

Details

• CRID: 1390001204593683072
• NII Article ID: 10018456837
• NII Book ID: AN10136312
• DOI: 10.1541/ieejfms.127.7
• ISSN: 13475533
• ISSN: 03854205
• Web Site: http://www.jstage.jst.go.jp/article/ieejfms/127/1/127_1_7/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed