イオンビーム誘起化学蒸着法による酸化スズ薄膜の作製 Tin Oxide Thin Films Prepared by Ion Beam Induced Chemical Vapor Deposition

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  We deposited transparent and electrical conductive thin films on polymer substrates ZEONOR<sup>®</sup> (cycloolefin) by oxygen ion beam induced chemical vapor deposition (IBICVD) with tetramethylstannane (TMS). The film depositions were carried out the acceleration voltage of oxygen ion beam in range from 50 to 300 eV. The deposition time was fixed at 180 minutes at all conditions. Under irradiation of 300 eV oxygen ions, the optical transmittance at 550 nm and the resistivity of the prepared film were 80% and 5.4×10<sup>-2</sup> Ω•cm, respectively. When oxygen ion energy increased from 50 to 300 eV, root mean square of roughness and contamination of carbon were decreased.<br>

収録刊行物

  • 真空  

    真空 49(12), 780-781, 2006-12-20 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10018457721
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • データ提供元
    CJP書誌  J-STAGE 
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