Formation of Nickel Hydroxide Thin Layer on the Surface of Nickel Electrode
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- Kodama Ayumi
- Ochanomizu University
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- Ikeda Hiroko
- Fukushima Medical University
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- Nakase Chiho
- Ochanomizu University
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- Masuda Takako
- Tokyo Medical University
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- Kitahara Keiichi
- Tokyo Medical University
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- Arai Sadao
- Tokyo Medical University
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- Onuma Yoshio
- Onuma Giken Co., Ltd.
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- Hayashi Koji
- Institute of Industrial Science, University of Tokyo
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- Yamashita Junzo
- Ochanomizu University
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- Aikawa Yoshihiro
- Ochanomizu University
Bibliographic Information
- Other Title
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- Ni電極表面におけるNi水酸化物膜の生成
- Ni デンキョク ヒョウメン ニ オケル Ni スイサンカブツ マク ノ セイセイ
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Abstract
Transient of current in thin layer formation on nickel electrode was investigated during an anodic potential step in 0.1 M NaOH aqueous solution. The current was shown to have a time-dependency of i(t)=i0[1+(t/τ)]-1/2 which was derived from ionic migration under potential drop through the surface thin film. In the equation, the initial current, i0, and the time constant, τ, after the potential step were estimated from the slope and the intercept on the 1/i2 vs. t plot, respectively. From a plot of i02τ vs. φ, the oxide layer thickness at the potential, φ0, before the step and an average ionic mobility in the oxide film were calculated. The oxide layer was found to grow from the potential of 0.02 V vs. SCE and to saturate in thickness at 1.3 nm at the potential range between 0.2 and 0.4 V. The average mobility was estimated to be μ=9.9×10-20m2V-1s-1.
Journal
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- Zairyo-to-Kankyo
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Zairyo-to-Kankyo 55 (12), 544-548, 2006
Japan Society of Corrosion Engineering
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Details 詳細情報について
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- CRID
- 1390282681237012352
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- NII Article ID
- 10018458384
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- NII Book ID
- AN10235427
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- ISSN
- 18819664
- 09170480
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- NDL BIB ID
- 8610186
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed