Fast Nanoimprint Thermal Lithography Using a Heated High-Aspect Ratio Mold

• Yoshinobu Nakada

• Kenrou Ninomiya

• Yasuhiro Takaki

書誌事項

タイトル別名

• Fast Nanoimprint Thermal Lithography Using a Heated High Aspect Ratio Mold

収録刊行物

• Japanese journal of applied physics. Part 2, Letters & express letters

  Japanese journal of applied physics. Part 2, Letters & express letters 45 (46-50), L1241-1243, 2006-12

  Tokyo : Japan Society of Applied Physics

キーワード

• nanoimprint lithography
• high throughput
• LSI
• MEMS

詳細情報

• CRID: 1520573330124609792
• NII論文ID: 10018460879
• NII書誌ID: AA11906093
• ISSN: 00214922
• NDL書誌ID: 8589644
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8589644
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • CiNii Articles