Protonation Sites in Chemically Amplified Resists for Electron-Beam Lithography

• Kenichiro Natsuda

• Takahiro Kozawa

• Kazumasa Okamoto

Bibliographic Information

Other Title

• Protonation Sites in Chemically Amplified Resists for Electron Beam Lithography

Journal

• Japanese journal of applied physics. Part 2, Letters & express letters

  Japanese journal of applied physics. Part 2, Letters & express letters 45 (46-50), L1256-1258, 2006-12

  Tokyo : Japan Society of Applied Physics

Keywords

• base quencher
• amine
• proton affinity
• chemically amplified resist

Details

• CRID: 1523669554974779136
• NII Article ID: 10018460952
• NII Book ID: AA11906093
• ISSN: 00214922
• NDL BIB ID: 8589717
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8589717
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • CiNii Articles