Liquid Crystal Alignment and Electrooptical Characteristics of Vertical Alignment Liquid Crystal Display on SiOx Thin Film Obliquely Deposited by Sputtering

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We studied the effects of liquid crystal (LC) alignment characteristics on a SiOx thin films of various thicknesses deposited at an oblique angle of 45° by RF magnetic sputtering. A uniform LC alignment characteristic was achieved on the SiOx thin film, and the pretilt angle was about 90°. The thermal stability of the SiOx thin film was sustained until 200 °C. There was no difference in LC aligning capability owing to the thickness of SiOx thin film obliquely deposited at 45°. The vertical alignment liquid crystal display (VA-LCD) on the SiOx thin film deposited at the oblique angle of 45° by sputtering showed good electrooptical characteristics. These results suggest that a uniform homeotropic LC alignment can be achieved and a large VA-LCD can be produced by sputtering.

収録刊行物

  • Japanese journal of applied physics. Pt. 2, Letters  

    Japanese journal of applied physics. Pt. 2, Letters 45(48), L1280-L1282, 2006-12-25 

    Japan Society of Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018461074
  • NII書誌ID(NCID)
    AA10650595
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8589823
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z54-J337
  • データ提供元
    CJP書誌  NDL  JSAP 
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