Photochemical Deposition of Patterned Gold Thin Films
Access this Article
Search this Article
We present a novel route for patterned gold thin-film deposition on glass substrates with the help of UV-light irradiation. Chloroauric acid (HAuCl4) is used as a source material and sodium sulfite (Na2SO3) acts as a reducing agent in an aqueous solution. Ethylene diamine (EDA) is added to increase the solution stability. The deposition solution is injected on the substrate. A patterned metal mask is placed 5 mm above the substrate, and the solution is illuminated for 15 min by an ultrahigh-pressure mercury arc lamp. A patterned Au film with a thickness of 0.1–0.2 μm is deposited.
- Jpn J Appl Phys
Jpn J Appl Phys 45(48), L1283-L1285, 2006-12-25
INSTITUTE OF PURE AND APPLIED PHYSICS