有機系吸着分子の電子・イオン誘起反応 Electron and Ion-Induced Reactions of Organic Molecules Adsorbed on the Surfaces

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The studies on the chemical reactions of organic molecules induced by low-energy electrons and gas cluster ions are reviewed. The author's group has developed the in-situ observation technique for electron-irradiated surfaces. The technique employs a scanning tunneling microscope as a field-emitted electron source, as well as a probe for surface analysis. By using the technique, we have investigated the effect of low-energy-electron irradiations to adsorbed molecules, such as ethylene and DNA. Desorption, dissociation of the molecules and changes to other chemical species, were observed, depending on electron energy and electron dosage. When a gas cluster ion, consisting of thousands of atoms or molecules, collides with a solid surface, several types of reactions are uniquely induced at the surface. The average kinetic energy of a constituent atom of the cluster can be defined by dividing the acceleration energy by the number of constituent atoms. Thus, very low-energy-ion irradiation is easily achieved by using large cluster ions. DNA adsorbed graphite surfaces were irradiated with argon(Ar) gas cluster ions. The secondary ion yield and the structural changes of the surfaces were investigated. These results are compared with the case by the irradiation with monomer ions (Ar<sup>+</sup>) and are discussed from the view point of the kinetic energy of a constituent atom of the cluster ion.

収録刊行物

  • 電気学会論文誌. C, 電子・情報・システム部門誌 = The transactions of the Institute of Electrical Engineers of Japan. C, A publication of Electronics, Information and System Society  

    電気学会論文誌. C, 電子・情報・システム部門誌 = The transactions of the Institute of Electrical Engineers of Japan. C, A publication of Electronics, Information and System Society 127(2), 112-117, 2007-02-01 

    The Institute of Electrical Engineers of Japan

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各種コード

  • NII論文ID(NAID)
    10018480311
  • NII書誌ID(NCID)
    AN10065950
  • 本文言語コード
    JPN
  • 資料種別
    REV
  • ISSN
    03854221
  • NDL 記事登録ID
    8667981
  • NDL 雑誌分類
    ZN31(科学技術--電気工学・電気機械工業)
  • NDL 請求記号
    Z16-795
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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