高速原子・分子ビームで誘起される表面ナノプロセス Surface Nano-Processes Induced by High-Speed Atomic and Molecular Beams

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著者

    • 寺岡 有殿 TERAOKA Yuden
    • (独)日本原子力研究開発機構 量子ビーム応用研究部門 Quantum Beam Science Directorate, Japan Atomic Energy Agency

抄録

Surface temperature and gas pressure are major parameters for control of chemical reactions between gas molecules and solid surfaces, followed by ultra-thin layers formation or etching reactions. Molecular adsorption at surfaces are occasionally induced by translational kinetic energy of incident molecules even if the incident energy is only several eV. The chemical reaction field is extended into a bulk region deeper than 10 nm if the incident energy is achieved to several keV. Thus the incident energy is the third parameter for control of chemical reactions. In this review article, generation methods of various kinds of high-speed atomic and molecular beams are briefly introduced. Especially, supersonic molecular beam techniques and neutral beam generation methods based on ion beams techniques are concretely explained. Furthermore, as an application of beam-induced surface nano-process study, etching induction at silicon surfaces by supersonic chlorine molecular beams, oxidation induction by supersonic oxygen molecular beams, and nitridation of a silicon oxide film on an Si(001) substrate at room temperature by nitrogen atomic ion beams are reviewed.

収録刊行物

  • 電気学会論文誌. C, 電子・情報・システム部門誌 = The transactions of the Institute of Electrical Engineers of Japan. C, A publication of Electronics, Information and System Society  

    電気学会論文誌. C, 電子・情報・システム部門誌 = The transactions of the Institute of Electrical Engineers of Japan. C, A publication of Electronics, Information and System Society 127(2), 118-125, 2007-02-01 

    The Institute of Electrical Engineers of Japan

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各種コード

  • NII論文ID(NAID)
    10018480329
  • NII書誌ID(NCID)
    AN10065950
  • 本文言語コード
    JPN
  • 資料種別
    REV
  • ISSN
    03854221
  • NDL 記事登録ID
    8668009
  • NDL 雑誌分類
    ZN31(科学技術--電気工学・電気機械工業)
  • NDL 請求記号
    Z16-795
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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