レーザプラズマ軟X線による無機透明材料のアブレーション加工 Micromachining of Inorganic Materials using Laser Plasma Soft X-Rays

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著者

    • 牧村 哲也 MAKIMURA Tetsuya
    • 筑波大学大学院数理物質科学研究科 電子・物理工学専攻 Institute of Applied Physics, University of Tsukuba
    • 内田 智 UCHIDA Satoshi
    • 筑波大学大学院数理物質科学研究科 電子・物理工学専攻 Institute of Applied Physics, University of Tsukuba
    • 新納 弘之 NIINO Hiroyuki
    • 独立行政法人 産業技術総合研究所 光技術研究部門 Photonics Research Institute, National Institute of Advanced Industrial Science and Technology
    • 村上 浩一 MURAKAMI Kouichi
    • 筑波大学大学院数理物質科学研究科 電子・物理工学専攻 Institute of Applied Physics, University of Tsukuba

抄録

We have investigated nanomachining of inorganic materials using laser plasma soft X-rays. The soft X-ray was generated by irradiating Ta targets with pulsed Nd:YAG laser light. The laser plasma soft X-rays were focused using an ellipsoidal mirror, which is designed so as to focus soft X-rays at around 10 nm efficiently. The focused soft X-rays were incident to the surfaces of inorganic materials such as silica glass, LiF, CaF<sub>2</sub> and LiNbO<sub>3</sub>. It is found that these materials are ablated by soft X-ray irradiation. In particular, silica glass can be ablated at rates of 0.2-150 nm/shot, which can be controlled by the intensity of soft X-rays. It is remarkable that silica can be ablated smoothly with a roughness of 1 nm after 10 shots of soft X-ray irradiation at a rate of 50 nm/shot. In order to demonstrate nanomachining of silica glass, we used contact masks on top of silica glass plates fabricated by electron beam lithography technique. The silica glass plates were irradiated with laser plasma soft X-rays through the windows of the contact masks. We found that nanofabrication of trenches with a width of 70 nm are performed clearly.

収録刊行物

  • 電気学会論文誌. C, 電子・情報・システム部門誌 = The transactions of the Institute of Electrical Engineers of Japan. C, A publication of Electronics, Information and System Society  

    電気学会論文誌. C, 電子・情報・システム部門誌 = The transactions of the Institute of Electrical Engineers of Japan. C, A publication of Electronics, Information and System Society 127(2), 179-184, 2007-02-01 

    The Institute of Electrical Engineers of Japan

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各種コード

  • NII論文ID(NAID)
    10018480450
  • NII書誌ID(NCID)
    AN10065950
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    03854221
  • NDL 記事登録ID
    8668325
  • NDL 雑誌分類
    ZN31(科学技術--電気工学・電気機械工業)
  • NDL 請求記号
    Z16-795
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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