次世代3次元X線リソグラフィーの提案と高輝度液晶バックライトユニット導光板への応用 [in Japanese] Proposal of a Next Generation 3 Dimensional X-ray Lithography and Its Application to Fabrication of High Luminescence Optical Waveguide for Liquid Crystal Back Light Unit [in Japanese]
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We have developed a new 3D x-ray lithography system for LIGA processing using synchrotron radiation at the NewSUBARU facility of the University of Hyogo. The x-ray lithography system can utilize two different energy regions; one is a high-energy region from 3 keV to 10 keV, and the other is a low-energy region from 0.1 to 2 keV. Each energy region can be selected in accordance with the size and shape of the desired microstructures. It is demonstrated that large-area high luminescence 7 inch optical waveguide for the liquid crystal back light unit was successfully fabricated using this x-ray lithography method.
- IEEJ Transactions on Electronics, Information and Systems
IEEJ Transactions on Electronics, Information and Systems 127(2), 185-191, 2007-02-01
The Institute of Electrical Engineers of Japan