選択成長マイクロファセットを用いたGaN系面発光型レーザー GaN-Based Surface-Emitting Lasers Using Micro-Facets Fabricated by Selective-Area Epitaxy

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GaN microfacets have been grown by selective-area metalorganic vapor phase epitaxy (SA-MOVPE) and applied to GaN-based surface-emitting lasers. The crystal orientation of the microfacets was strictly controlled by the shapes of the mask-openings and growth conditions so that vertical and inclined microfacets were obtained. Hexagonal microprisms (HMPs) of GaN with 5-50μm in diameters have extremely smooth vertical side walls of GaN {10 1 0} microfacets. These GaN HMPs lase by optical pumping and have the inscribed hexagonal optical paths. Additionally, GaN-based horizontal cavity surface-emitting lasers (HCSELs) were successfully fabricated. The GaN-based HCSELs have Fabry-Perot cavity and outer micromirrors, which consist of SA-MOVPE grown {11 2 0} vertical and {11 2 2} inclined microfacets, and lased at room temperature by pulsed current injection. The laser beam emitted laterally from a Fabry-Perot cavity {11 2 0} vertical micromirror is reflected by a {11 2 2} inclined outer micromirror so as to be directed upward. The GaN-based HCSEL has a current-confining structure because the incorporation probability of p-type dopants (Mg) is strongly influenced by facet orientation (growth direction).

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  • レーザー研究  

    レーザー研究 35(2), 79-85, 2007-02-15 

    The Laser Society of Japan

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各種コード

  • NII論文ID(NAID)
    10018544469
  • NII書誌ID(NCID)
    AN00255326
  • 本文言語コード
    JPN
  • 資料種別
    REV
  • ISSN
    03870200
  • NDL 記事登録ID
    8712098
  • NDL 雑誌分類
    ZN33(科学技術--電気工学・電気機械工業--電子工学・電気通信)
  • NDL 請求記号
    Z16-1040
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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