Simply Controlled Growth Condition of Thin Films of InTaO4(111) on MgO(001) Substrates by Ar Ion Beam Sputtering

• Kazuhiko Maruta

• Hajime Kawakami

• Kunisuke Maki

書誌事項

タイトル別名

• Simply Controlled Growth Condition of Thin Films of InTaO4 111 on MgO 001 Substrates by Ar Ion Beam Sputtering

抄録

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

収録刊行物

• Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

  Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 46 (2), 774-776, 2007-02

  Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

キーワード

• thin film growth
• Ta2O5
• O2 ion assisted deposition

詳細情報

• CRID: 1520853832396750464
• NII論文ID: 10018545790
• NII書誌ID: AA10457675
• ISSN: 00214922
• ISSN: 13474065
• DOI: 10.1143/jjap.46.774
• NDL書誌ID: 8651909
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8651909
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.774
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.774/pdf
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • Crossref
  • CiNii Articles