大気圧非平衡プラズマのミクロ構造を利用した垂直配向単層カーボンナノチューブの合成 Synthesis of Vertically-Aligned Single-Walled Carbon Nanotubes in Micro Structure of Atmospheric Pressure Non-Equilibrium Plasma

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Plasma enhanced chemical vapor deposition (PECVD) is recognized as one of the viable fabrication techniques of carbon nanotubes. The outstanding advantage of PECVD is that free-standing, vertically-aligned carbon nanotubes (VA-CNTs) are synthesized due to the electric field normal to the substrate. This feature draws intense attention for the fabrication of nanoelectronic devices such as high-resolution scanning nanoprobes, interconnects, and field emission devices. However, carbon nanotubes synthesized in PECVD are overwhelmingly carbon nanofibers (CNFs) or multi-walled carbon nanotubes (MWNTs) with measurable structural defects. Tremendous interest in the preparation and characterization of vertically-aligned single-walled carbon nanotubes (VA-SWNTs) and related applications had not been realized in the scope of PECVD until recently. Here we present a fabrication technique of high-purity vertically-aligned single-walled carbon nanotubes using atmospheric pressure plasma enhanced chemical vapor deposition. By now, we have developed the atmospheric pressure radio-frequency discharge (APRFD) for this purpose. Although densely mono-dispersed Fe-Co catalysts of a few nanometers is primarily responsible for VA-SWNT growth, carbon precipitation was virtually absent in the thermal CVD regime at 700°C. On the other hand, high-yield VA-SWNTs were grown at 4 μm min<sup>-1</sup> by applying the atmospheric pressure radio-frequency discharge. The results proved that cathodic ion sheath adjacent to the substrates, where a large potential drop exists, also plays an essential role for the controlled growth of SWNTs, while ion damage to the VA-SWNTs is inherently avoided due to high collision frequency among molecules in atmospheric pressure. In this paper, operation regime of APRFD and tentative reaction mechanisms for VA-SWNT growth are discussed along with optical imaging of near substrate region of APRFD.

収録刊行物

  • 伝熱 : journal of the Heat Transfer Society of Japan  

    伝熱 : journal of the Heat Transfer Society of Japan 46(194), 9-14, 2007-01-01 

    The Heat Transfer Society of Japan

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各種コード

  • NII論文ID(NAID)
    10018576161
  • NII書誌ID(NCID)
    AA11315621
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    13448692
  • NDL 記事登録ID
    8658359
  • NDL 雑誌分類
    ZM5(科学技術--科学技術一般--工学・工業)
  • NDL 請求記号
    Z54-J404
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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