Enhancement of Nucleation Density in Plasma CVD by Ultra-short High-voltage Pulses

• YASUDA Shin-ichi

  Research Center for Carbon Recycling and Utilization, Tokyo Institute of Technology

• OKAZAKI Ken

  Research Center for Carbon Recycling and Utilization, Tokyo Institute of Technology

収録刊行物

• Thermal science and engineering

  Thermal science and engineering 3 (3), 63-68, 1995-05-01

キーワード

• Pulsed Plasma
• Plasma CVD
• Plasma Structure
• Nucleation
• Diamond thin film

詳細情報

• CRID: 1570854175404583808
• NII論文ID: 10018603242
• NII書誌ID: AA11358679
• ISSN: 09189963
• 本文言語コード: en
• データソース種別:
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