Slipfree Realization by Resistance Heating from Water Backside in Silicon Epitaxial Reactor

• SATO Yuusuke

  Toshiba Corporation

Bibliographic Information

Other Title

• シリコンエピ装置におけるウエハ裏面よりの抵抗加熱によるスリップフリー実現

Journal

• 伝熱研究 = News of HTSJ

  伝熱研究 = News of HTSJ 34 (133), 70-, 1995-04-01

Details

• CRID: 1570572700427514112
• NII Article ID: 10018606480
• NII Book ID: AN0015409X
• ISSN: 09107851
• Text Lang: ja
• Data Source:
  • CiNii Articles