Joule-Heating-Induced Annealing by Applying Electric Field Directly to Intrinsic Silicon Film

• Jae-Sang Ro

• Won-Eui Hong

書誌事項

タイトル別名

• Joule Heating Induced Annealing by Applying Electric Field Directly to Intrinsic Silicon Film

収録刊行物

• Japanese journal of applied physics. Part 2, Letters & express letters

  Japanese journal of applied physics. Part 2, Letters & express letters 45 (42-45), L1142-1145, 2006-11

  Tokyo : Japan Society of Applied Physics

キーワード

• Joule heating
• crystallization
• thin-film transistor

詳細情報

• CRID: 1524232503221630208
• NII論文ID: 10018632275
• NII書誌ID: AA11906093
• ISSN: 00214922
• NDL書誌ID: 8548254
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8548254
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • CiNii Articles