Thermodynamic Analysis of Various Types of Hydride Vapor Phase Epitaxy System for High-Speed Growth of InN

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著者

    • Kikuchi Jun Kikuchi Jun
    • Department of Applied Chemistry, Graduate School of Engineering, Tokyo University of Agriculture and Technology, 2-24-16 Naka-cho, Koganei, Tokyo 184-8588, Japan
    • Nishizawa Yuuki Nishizawa Yuuki
    • Department of Applied Chemistry, Graduate School of Engineering, Tokyo University of Agriculture and Technology, 2-24-16 Naka-cho, Koganei, Tokyo 184-8588, Japan
    • Murakami Hisashi [他] Murakami Hisashi
    • Strategic Research Initiative for Future Nano-Science and Technology, Institute of Symbiotic Science and Technology, Tokyo University of Agriculture and Technology, 2-24-16 Naka-cho, Koganei, Tokyo 184-8588, Japan
    • Kumagai Yoshinao
    • Strategic Research Initiative for Future Nano-Science and Technology, Institute of Symbiotic Science and Technology, Tokyo University of Agriculture and Technology, 2-24-16 Naka-cho, Koganei, Tokyo 184-8588, Japan
    • Koukitu Akinori
    • Strategic Research Initiative for Future Nano-Science and Technology, Institute of Symbiotic Science and Technology, Tokyo University of Agriculture and Technology, 2-24-16 Naka-cho, Koganei, Tokyo 184-8588, Japan

抄録

The hydride vapor phase epitaxy (HVPE) of InN with various configurations was studied by thermodynamic analysis. For the high-speed growth of InN, analyses of the source zone and InN growth zone were performed. It was shown that the use of Cl2 instead of HCl as a chlorine source is necessary for the HVPE of InN. An additional supply of Cl2 was found to be effective for the preferential generation of a reactive InCl3 precursor. A new system, the (In–Cl2)–Cl2–NH3 system, was proposed for the HVPE of InN with a high growth rate.

収録刊行物

  • Japanese journal of applied physics. Pt. 2, Letters  

    Japanese journal of applied physics. Pt. 2, Letters 45(45), L1203-L1205, 2006-11-25 

    Japan Society of Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018632545
  • NII書誌ID(NCID)
    AA10650595
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8548608
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z54-J337
  • データ提供元
    CJP書誌  NDL  JSAP 
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