レイアウト設計後の最適化による光近接効果補正技術の提案 Optical Proximity Correction using an Optimization Method after Layout Design

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This paper proposes an optical proximity correction (OPC) using an Adjustable OPCed cell and genetic algorithms (GA) to achieve optimal OPC feature generation for the full-chip area at fast processing speeds. GA is an efficient optimization technique based on population genetics. In this approach, an Adjustable OPCed cell consists of two parts. The first part is the "fixed area", which includes OPC feature data from a conventional OPC technique. The second part is the "adjustable area", which is located in the peripheral regions of the cell and includes adjustable OPC variables. As the values of these variables are greatly influenced by neighboring cell patterns, the variables are quickly optimized by the GA after cell layout. The effectiveness of this approach, in terms of reduced times for accurate simulations and repeated modification of OPCed features, is demonstrated through computational experiments.

収録刊行物

  • 電気学会論文誌. C, 電子・情報・システム部門誌 = The transactions of the Institute of Electrical Engineers of Japan. C, A publication of Electronics, Information and System Society  

    電気学会論文誌. C, 電子・情報・システム部門誌 = The transactions of the Institute of Electrical Engineers of Japan. C, A publication of Electronics, Information and System Society 127(1), 1-9, 2007-01-01 

    The Institute of Electrical Engineers of Japan

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各種コード

  • NII論文ID(NAID)
    10018660540
  • NII書誌ID(NCID)
    AN10065950
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    03854221
  • NDL 記事登録ID
    8623579
  • NDL 雑誌分類
    ZN31(科学技術--電気工学・電気機械工業)
  • NDL 請求記号
    Z16-795
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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