Monitoring Reaction Products of Novolac Resists during Puddle Development

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著者

    • Eto Hideo Eto Hideo
    • Postgraduate Courses of Functional Control Systems, Shibaura Institute of Technology, 3-9-14 Shibaura, Minato-ku, Tokyo 108-8548, Japan
    • Homma Tetsuya Homma Tetsuya
    • Postgraduate Courses of Functional Control Systems, Shibaura Institute of Technology, 3-9-14 Shibaura, Minato-ku, Tokyo 108-8548, Japan

抄録

We have developed a new technique for monitoring the concentration of reaction products during puddle development in ultralarge-scale integration (ULSI) lithography. Optical measurement has been employed for monitoring the concentration of reaction products by detecting reflected light from a wafer surface, and compared with the sampling method (UV–visible spectroscopy) for reaction products from a developer solution. A correlation coefficient of 0.89 was obtained, indicating a good correlation between this optical method and sampling method. We concluded that the newly developed optical monitoring technique is useful for measuring the concentration of reaction products.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes  

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 46(1), 128-130, 2007-01-15 

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018704458
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8606009
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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