Photochemical Modification of Diamond Films with Sulfur-Containing Functionalities

この論文にアクセスする

この論文をさがす

著者

    • Nakamura Takako Nakamura Takako
    • National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
    • Ohana Tsuguyori Ohana Tsuguyori
    • National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
    • Koga Yoshinori
    • National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan

抄録

Photolysis of cyclic disulfides in the presence of diamond films led to a surface modification that introduced thioalkylthiol functional groups, as confirmed by Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (TOF-SIMS). The S/C ratio of sulfur-modified diamond films depends on irradiation time, as monitored by XPS. Through thioalkylthiol moieties, the attachment of gold nanoparticles using a self-assembly process was performed on diamond surfaces.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes  

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 46(1), 348-350, 2007-01-15 

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

参考文献:  16件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10018705365
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8607007
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
ページトップへ