Fabrication and Evaluation of Band-Selection Interleaver on Silicon Waveguide

• MATSUI Junya

  Department of Science and Engineering, Waseda University

• HONDA Soichiro

  Department of Science and Engineering, Waseda University

• WU Zhigang

  Department of Science and Engineering, Waseda University

• UTAKA Katsuyuki

  Department of Science and Engineering, Waseda University

• EDURA Tomohiko

  Nano Technology Research Center, Waseda University

• TOKUDA Masahide

  Nano Technology Research Center, Waseda University

• TSUTSUI Ken

  Nano Technology Research Center, Waseda University

• WADA Yasuo

  Nano Technology Research Center, Waseda University

Bibliographic Information

Other Title

• シリコン導波路上ブラッググレーティングによるバンド選択インターリーバの作製と評価

Journal

• 電子情報通信学会技術研究報告. OPE, 光エレクトロニクス

  電子情報通信学会技術研究報告. OPE, 光エレクトロニクス 106 (514), 109-112, 2007-01-22

Keywords

• WDM
• SOI
• Bragg Grating
• Filter Device
• Interleaver
• Thermooptic Effect
• Tuning
• Michelson Interferometer

Details

• CRID: 1570009750479200384
• NII Article ID: 10018728114
• NII Book ID: AN10442691
• Text Lang: ja
• Data Source:
  • CiNii Articles