Microwave Heating of Thin Au Film

• Sueyoshi Hidekazu

  Department of Nano Structure and Advanced Materials, Graduate School of Science and Engineering, Kagoshima University

• Kakiuchi Shigeki

  Department of Nano Structure and Advanced Materials, Graduate School of Science and Engineering, Kagoshima University

Abstract

Thin Au film was prepared by sputtering and evaporation methods with a quartz substrate, followed by microwave irradiation in air (frequency of microwave: 2.45 GHz, incident flux of microwave: 563 W, irradiation time: 600 s). As a result, it was confirmed that microwave heating of thin Au film is feasible. The growth of crystalline and particles due to microwave heating was confirmed from AFM observation and XRD analysis.<BR>Thin Au film is continuously heated during microwave irradiation, regardless of a preparation method of thin film. Microwave heating depends on the amount of microwave absorption on a thin Au film, which is related to the thickness and microstructure of the thin Au film. The rate of temperature rise depends on the ratio of a thickness to resistivity of thin Au film.

Journal

• MATERIALS TRANSACTIONS

  MATERIALS TRANSACTIONS 48 (3), 531-537, 2007

  The Japan Institute of Metals and Materials

Keywords

• microwave irradiation
• heating
• thin gold film
• film thickness
• microstructure
• sputtering
• evaporation

Details

• CRID: 1390282679228060288
• NII Article ID: 130004453499
• NII Article ID: 10018735071
• NII Book ID: AA1151294X
• DOI: 10.2320/matertrans.48.531
• ISSN: 13475320
• ISSN: 13459678
• NDL BIB ID: 8671159
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8671159
• Web Site: https://www.jstage.jst.go.jp/article/matertrans/48/3/48_MRA2006318/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed