Multi-Probe SPM using Interference Patterns for a Parallel Nano Imaging
Access this Article
Search this Article
This paper proposes a new composition of the multi-probe using optical interference patterns for a parallel nano imaging in a large area scanning. We achieved large-scale integration with 50,000 probes fabricated with MEMS technology, and measured the optical interference patterns with CCD, which was difficult in a conventional single scanning probe. In this research, the multi-probes are made of Si3N4 by MEMS process, and, the multi-probes are joined with a Pyrex glass by an anodic bonding. We designed, fabricated, and evaluated the characteristics of the probe. In addition, we changed the probe shape to decrease the warpage of the Si3N4 probe. We used the supercritical drying to avoid stiction of the Si3N4 probe with the glass surface and fabricated 4 types of the probe shapes without stiction. We took some interference patterns by CCD and measured the position of them. We calculate the probe height using the interference displacement and compared the result with the theoretical deflection curve. As a result, these interference patterns matched the theoretical deflection curve. We found that this multi-probe chip using interference patterns is effective in measurement for a parallel nano imaging.
- The Journal of the Institute of Electrical Engineers of Japan
The Journal of the Institute of Electrical Engineers of Japan 127(3), 182-186, 2007-03-01
The Institute of Electrical Engineers of Japan