Efficient Conversion of NO_2 into N_2 and O_2 in N_2 or into N_2O_5 in Air by 172-nm Xe_2 Excimer Lamp at Atmospheric Pressure

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著者

    • TSUJI Masaharu
    • Institute for Materials Chemistry and Engineering, Kyushu University
    • SENDA Makoto
    • Institute for Materials Chemistry and Engineering, Kyushu University
    • NODA Kenji
    • Department of Applied Science for Electronics and Materials, Graduate School of Engineering Sciences, Kyushu University

抄録

Decomposition of NO<SUB>2</SUB> (200 ppm) in N<SUB>2</SUB> or air by 172-nm Xe<SUB>2</SUB> excimer lamp was studied at 1 atm. The NO<SUB>2</SUB> conversion in N<SUB>2</SUB> was 99%, and the formation ratios of N<SUB>2</SUB>, O<SUB>2</SUB>, NO, and N<SUB>2</SUB>O were 47, 98, 0, and 2%, respectively, after 30 min irradiation. The NO<SUB>2</SUB> in air (5–20% O<SUB>2</SUB>) could be completely converted to N<SUB>2</SUB>O<SUB>5</SUB> and HNO<SUB>3</SUB> due to reactions by O<SUB>3</SUB> and H<SUB>2</SUB>O after only 1.0–1.5 min irradiation. The present results give a new simple photochemical aftertreatment technique of NO<SUB>2</SUB> in air without using any catalysts.

収録刊行物

  • Chemistry letters  

    Chemistry letters 36(3), 376-377, 2007-03-05 

    The Chemical Society of Japan

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各種コード

  • NII論文ID(NAID)
    10018829389
  • NII書誌ID(NCID)
    AA00603318
  • 本文言語コード
    ENG
  • 資料種別
    SHO
  • ISSN
    03667022
  • データ提供元
    CJP書誌  J-STAGE 
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