The Importance of Precursor Molecules Symmetry in the Formation of Self-Assembled Monolayers

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We investigated the role of precursors molecular symmetry in the self-assembled formation of organosilane monolayer by applying atomic force microscopy (AFM), grazing incidence X-ray diffraction (GIXD), Fourier transform infrared spectroscopy (FT-IR) and contact angle measurement. Octadencyltrichlorosilane (OTS), octadecylmethydichlorosilane (ODCS), and octadecyldimethylchlorosilane (ODMS) were used as raw materials to form organosilane monolayers. The organosilane monolayers were prepared by a liquid phase method at a reaction temperature of 5 °C and an humidity in reactor of 50%. AFM observations suggested that only OTS molecules grew two-dimensionally on the Si substrate surface. In GIXD results showed these OTS molecules to be arranged in a crystalline state on the Si surface. Thus "self-organization" occurred during OTS monolayer formation process. However, in the case of ODCS and ODMS, the monolayers formed were in an amorphous state. In addition, FT-IR and water contact angle measurement indicated that the packing density of the OTS monolayer was higher than that of the ODCS and ODMS monolayers. Only when the precursor molecules had an axis where the silanol groups were in three-fold did "self-organization" occurs in the formation of the organosiloxane monolayer.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes  

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 46(3A), 1118-1123, 2007-03-15 

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018867451
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8688371
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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