# Temperature and Density of CF Radicals in 60 MHz Capacitively Coupled Fluorocarbon Gas Plasma

## 抄録

Both optical emission spectroscopy and infrared diode laser absorption spectroscopy were applied to measurements of rotational temperatures of CF radicals in 60 MHz capacitively coupled CF4 and CF4/Ar plasmas. The rotational temperature of CF radicals in the excited state was determined by fitting the optical emission spectra with the calculation results. The calculation for emission spectra was performed using two different rotational constant value of $A=0.76$ and 4.48 for the B$^{2}\Delta$ state, and then the constant $A$ was evaluated to be 0.76 from the emission intensities. In the CF4 plasma, the CF rotational temperature was increased from 300 to 380 K as the 60 MHz power was increased from 300 to 1500 W, and the radical density was increased from $1.59\times 10^{12}$ to $5.05\times 10^{12}$ cm-3. On the other hand, in the CF4/Ar plasma, the CF rotational temperature was increased by 20 K with the power, and the radical density was constant at $1.1\times 10^{12}$ cm-3. It was found that the rotational temperatures of CF radicals in the excited state were in equilibrium with those in the ground state under the present conditions.

## 収録刊行物

• Japanese journal of applied physics. Pt. 1, Regular papers & short notes

Japanese journal of applied physics. Pt. 1, Regular papers & short notes 46(3A), 1176-1180, 2007-03-15

Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

## 各種コード

• NII論文ID(NAID)
10018867627
• NII書誌ID(NCID)
AA10457675
• 本文言語コード
EN
• 資料種別
ART
• 雑誌種別
大学紀要
• ISSN
0021-4922
• NDL 記事登録ID
8688563
• NDL 雑誌分類
ZM35(科学技術--物理学)
• NDL 請求記号
Z53-A375
• データ提供元
CJP書誌  NDL  JSAP

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