Dual workfunction Ni-silicide/HfSiON gate stacks by phase-controlled full-silicidation (PC-FUSI) technique for 45nm-node LSTP and LOP devices

• TAKAHASHI K.

収録刊行物

• IEDM Tech. Dig., 2004

  IEDM Tech. Dig., 2004 2004

詳細情報

• CRID: 1572543025220689024
• NII論文ID: 10018897118
• データソース種別:
  • CiNii Articles