Performance enhancement in 45-nm Ni fully-silicided gate/high-k CMIS using substrate ion implantation

• NISHIDA Y.

収録刊行物

• VLSI Tech. Dig., 2006

  VLSI Tech. Dig., 2006 2006

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• CRID: 1572543025220690176
• NII論文ID: 10018897120
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