F2 Laser Photochemical Welding of Aligned Silica Microspheres to Silicone Rubber

この論文にアクセスする

この論文をさがす

著者

    • Okoshi Masayuki Okoshi Masayuki
    • Department of Electrical and Electronic Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka, Kanagawa 239-8686, Japan
    • Cho JaeBong Cho JaeBong
    • Department of Electrical and Electronic Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka, Kanagawa 239-8686, Japan
    • Inoue Narumi Inoue Narumi
    • Department of Electrical and Electronic Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka, Kanagawa 239-8686, Japan

抄録

Precisely aligned transparent fused-silica (SiO2) microspheres 2.5 μm in diameter were nonthermally welded to silicone rubber by 157 nm F2-laser-induced photochemical modification of the silicone into silica. A short exposure to the F2 laser of ${\sim}10$ mJ/cm2 single-pulse fluence, 10 Hz pulse repetition rate and 600 pulses was required for sufficient photochemical welding. The welding strength depended on the extent of the silica formation, which was controlled by F2 laser exposure. Silica formation occurred even in silicone underneath the microspheres due to the F2 laser decomposition of oxygen molecules dissolved in the silicone. A cross-sectional atomic force microscope image of silicone underneath the microspheres after welding revealed that a large contact area between the silicone and the microspheres was formed. After welding, the aligned silica microspheres were butt-coupled to a tapered silica optical fiber ${\sim}2.5$ μm in diameter for optical waveguide applications. The alignment was found to have the capability of guiding red (635 nm)-wavelength light.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes  

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 46(4A), 1516-1520, 2007-04-15 

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

参考文献:  16件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

被引用文献:  1件

被引用文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10018900752
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8706168
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  CJP引用  NDL  JSAP 
ページトップへ