Birefringence and Optical Waveguiding Losses in Preferentially $c$-Axis Oriented LiNbO3 Thin Films on SiO2 Produced by Electron Cyclotron Resonance Plasma Sputtering

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LiNbO3 (LN) films deposited on SiO2 substrate by electron cyclotron resonance plasma sputtering and thermal treatment were structurally and optically characterized. Birefringence between 60 and 70% for single crystal was confirmed for $c$-axis oriented films on both Si and SiO2, whereas non-annealed amorphous film was optically isotropic. Crystallization during sputtering produced less than a 10% volume fraction of $c$-axis oriented spherical domains associated with the interface roughness layer. This sample had a large propagation loss of 32 dB/cm at 632.8 nm due to light scattering at the grain boundaries. LN films subjected to solid phase crystallization in a vacuum produced highly $c$-axis oriented columnar texture domains, which yielded propagation losses between 5 and 19 dB/cm, depending on the thickness (0.64–1.35 μm) and the mode order. The bulk and surface origins for waveguiding losses are discussed based on the film structure.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes  

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 46(4A), 1543-1548, 2007-04-15 

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018900873
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8706213
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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