Effect of Sputtering Power of Aluminum Film in Aluminum Induced Crystallization of Low Temperature Polycrystalline Silicon Film

この論文にアクセスする

この論文をさがす

著者

抄録

In this study we produced a low-temperature polycrystalline silicon (LTPS) film by aluminum induced crystallization (AIC) on a Corning EAGLE2000 glass substrate. Five types of specimen, with the DC sputtering powers of aluminum films of 100, 200, 400, 800, and 1600 W, were prepared. Crystal quality, surface morphology, roughness, and film stress were analyzed. Results show that surface roughness increases proportionally with sputtering power. The numbers of bulges and cracks observed on the polycrystalline silicon (poly-Si) thin film surface increase with sputtering power. The calculated film stresses are tensile when the sputtering powers are 100 and 200 W but they become compressive as the sputtering power is further increased. The optimal aluminum film sputtering power range for inducing the crystallization of amorphous silicon is also discussed.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 46(4A), 1635-1639, 2007-04-15

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

参考文献:  10件中 1-10件 を表示

  • <no title>

    LEE S. W.

    Appl. Phys. Lett. 66, 1671, 1995

    被引用文献1件

  • <no title>

    KIM H.

    Curr. Appl. Phys. 2, 129, 2002

    被引用文献1件

  • <no title>

    DOI A.

    Thin Solid Films 451, 485, 2004

    被引用文献1件

  • <no title>

    STONEY G. G.

    Proc. R. Soc. London, Ser. A 82, 172, 1909

    被引用文献1件

  • <no title>

    SOMEKAWA H.

    Mater. Trans. 44, 1640, 2003

    被引用文献1件

  • <no title>

    HUNG L. S.

    J. Appl. Phys. 59, 2416, 1986

    被引用文献1件

  • <no title>

    SHAHIDUL HAQUE M.

    J. Appl. Phys. 75, 3928, 1994

    DOI 被引用文献1件

  • <no title>

    LENGSFELD P.

    J. Non-Cryst. Solids 299, 778, 2002

    被引用文献1件

  • <no title>

    DIMOVA-MALINOVSKA D.

    Thin Solid Films 451-452, 303, 2004

    DOI 被引用文献1件

  • <no title>

    DE WOLF I.

    Opt. Lasers Eng. 36, 213, 2001

    被引用文献1件

各種コード

  • NII論文ID(NAID)
    10018901219
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8707316
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
ページトップへ