Effect of sputtering power of aluminum film in aluminum induced crystallization of low temperature polycrystalline silicon film

• Hsiao-Yeh Chu

• Ming-Hang Weng

• Chih-Cheng Nien

抄録

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

収録刊行物

• Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

  Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 46 (4A), 1635-1639, 2007-04

  Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

キーワード

• AIC
• polycrystalline silicon
• sputtering power
• LTPS
• film stress

詳細情報

• CRID: 1520290883722881536
• NII論文ID: 10018901219
• NII書誌ID: AA10457675
• ISSN: 00214922
• ISSN: 13474065
• DOI: 10.1143/jjap.46.1635
• NDL書誌ID: 8707316
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8707316
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.1635
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.1635/pdf
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • Crossref
  • CiNii Articles