Improvements of Defects by Patterning Using Thermal Nanoimprint Lithography

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抄録

Achieving excellent reliability for imprint patterns molded by stamps for the industrial application of nanoimprint lithography (NIL) is an important challenge. Usually, defects are produced by incomplete filling of negative patterns and the shrinkage phenomenon of polymers in conventional NIL. In our research, we investigated patterns that undergo varied temperature or varied pressure periods during thermal NIL with the goal of resolving issues dealing with the shrinkage and defective filling of polymers. The effects on the formation of polymer patterns in several profiles of imprint processes were also studied. Consequently, we observed that more precise patterns were formed with varied temperature (VT)-NIL and varied pressure (VP)-NIL. NIL has a free space compensation effect on the polymers in the stamp cavities. From the results of the experiments, the polymer's filling capability was improved. The VT-NIL was merged with the VP-NIL for a better filling property. The patterns imprinted using the merged NIL were compared with the results of the conventional NIL. In this study, an improvement in reliability from the results of thermal NIL was achieved.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes  

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 46(4A), 1808-1814, 2007-04-15 

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018901864
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8707656
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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