Evaluation of Vacuum Microcapsule Fabricated using Focused-Ion-Beam Chemical-Vapor-Deposition

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We fabricated a silicon dioxide-based vacuum microcapsule using focused-ion-beam chemical-vapor-deposition (FIB-CVD) to realize three high-performance vacuum electronic micro-devices: a diode, a triode, and a sensor. We measured the electrical characteristics of diamond-like carbon (DLC) and silicon dioxide (SiO2) deposited using FIB-CVD, and found that they had characteristics that are useful in conductors and insulators, respectively, used in vacuum micro-device fabrication. Furthermore, to evaluate the inner vacuum of a microcapsule, a diode with a microcapsule was fabricated using FIB-CVD. By measuring the current–voltage ($I$–$V$) characteristics of the diode, it was demonstrated that the inner vacuum of the microcapsule was maintained. This result indicates that various high-performance three-dimensional vacuum micro-devices can be fabricated using FIB-CVD on any surface.

収録刊行物

  • Japanese journal of applied physics. Pt. 2, Letters  

    Japanese journal of applied physics. Pt. 2, Letters 46(8), L180-L183, 2007-03-25 

    Japan Society of Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018902988
  • NII書誌ID(NCID)
    AA10650595
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8695313
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z54-J337
  • データ提供元
    CJP書誌  NDL  JSAP 
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