Evaluation of Vacuum Microcapsule Fabricated using Focused-Ion-Beam Chemical-Vapor-Deposition
We fabricated a silicon dioxide-based vacuum microcapsule using focused-ion-beam chemical-vapor-deposition (FIB-CVD) to realize three high-performance vacuum electronic micro-devices: a diode, a triode, and a sensor. We measured the electrical characteristics of diamond-like carbon (DLC) and silicon dioxide (SiO2) deposited using FIB-CVD, and found that they had characteristics that are useful in conductors and insulators, respectively, used in vacuum micro-device fabrication. Furthermore, to evaluate the inner vacuum of a microcapsule, a diode with a microcapsule was fabricated using FIB-CVD. By measuring the current–voltage ($I$–$V$) characteristics of the diode, it was demonstrated that the inner vacuum of the microcapsule was maintained. This result indicates that various high-performance three-dimensional vacuum micro-devices can be fabricated using FIB-CVD on any surface.
- Japanese journal of applied physics. Pt. 2, Letters
Japanese journal of applied physics. Pt. 2, Letters 46(8), L180-L183, 2007-03-25
Japan Society of Applied Physics