High-rate deposition of microcrystalline silicon photovoltaic active layers by plasma-enhanced chemical vapor deposition at kilo-pascal pressures

• Yasushi Sobajima

• Shinya Nakano

• Toshihiko Toyama

書誌事項

タイトル別名

• High rate deposition of microcrystalline silicon photovoltaic active layers by plasma enhanced chemical vapor deposition at kilo pascal pressures

収録刊行物

• Japanese journal of applied physics. Part 2, Letters & express letters

  Japanese journal of applied physics. Part 2, Letters & express letters 46 (8-11), L199-201, 2007-03

  Tokyo : Japan Society of Applied Physics

キーワード

• solar cells
• microcrystalline
• silicon
• thin film
• chemical vapor deposition
• plasma
• high deposition rate

詳細情報

• CRID: 1520573330240813824
• NII論文ID: 10018903072
• NII書誌ID: AA11906093
• ISSN: 00214922
• NDL書誌ID: 8695372
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8695372
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • CiNii Articles